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EquipmentSpecifications
UV-vis Specord 50 Single-beam 190 nm - 1000 nm, liquid samples
UV-vis Specord 210 Plus Double-beam 190 nm - 1000 nm, liquid and solid samples
Cary Eclipse Photoluminescence and phosphorescence measurements, 190 nm – 1000 nm, liquid samples
Horiba MacroRaman 785 nm laser, 100 – 3400 cm-1 spectral range, liquid and solid samples
Filmetrics F20 Thin-film thickness measurement 10 ? – 10 mm
Linari electrospinning machine Fabrication of nanofibers
BASi Epsilon E2 potentiostat Electrochemical characterization
Monowave 50 Microwave synthetic reactor, max. pressure 20 bar, max. temperature 250 °C, 6 mL max. volume
Furnace Tube furnace, max. temperature 1400 °C
Vacuum oven Vacuum range 10 – 750 mmHg, max. temperature 200 °C
Chemat spin coater Two stages, stage I: speed 500 ? 2,500 rpm 2-18 seconds, stage II: speed 1,000 ? 8,000 rpm 3-60 seconds
Cressington 108 auto sputter coater  with thickness controller Au and Pt targets

 

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